99.99% Nickel Ni Sputtering Targets
99.99% Nickel Ni Sputtering Targets Description
99.99% Nickel Ni Sputtering Targets are high purity targets made of nickel metal by electrolytic refining and vacuum smelting processes with good sputtering rate and coating quality. They are widely used in the data storage industry, electronic semiconductor industry, thin film deposition (CVD and PVD), etc. Integrated circuit manufacturing, photoconductive film, optical communication, aerospace, nuclear energy industry, glass coating (automotive, furniture, and construction), and other fields.
99.99% Nickel Ni Sputtering Targets Features
1. High strength, high toughness, can withstand greater external force, and is not easy to deform or fracture, to ensure the uniformity and continuity of the film layer
2. Excellent thermal stability and chemical stability, it is not easy to oxidation or corrosion under acidic or alkaline conditions
3. Good thermal conductivity and conductivity, can withstand long-term current bombardment, has a certain heat dissipation effect
4. specific electrical and magnetic properties, suitable for a variety of high-tech applications
99.99% Nickel Ni Sputtering Targets Specifications:
|
Purity |
99.99(4N) |
|
Thickness |
1mm-10mm |
|
Diameter |
10mm-360mm |
|
Density |
8.9g/cm3 |
|
Shape |
Disc |
|
Surface |
Polishing, Alkali Cleaning, Grinding, Black Oxide, etc. |
|
Standards: |
ASTM B865, GB/T |
|
Certification |
ISO9001 |
99.99% Nickel Ni Sputtering Targets Picture
