Aluminum Silicon AlSi Round Target
Aluminum Silicon AlSi Round Target Description
We use high-purity aluminum and silicon as raw materials to accurately weigh and match aluminum and silicon raw materials. Then high temperature melting, forging pressing, heat treatment, cutting grinding and other processing, and will be strictly tested before delivery.
Features
- Good electrical conductivity, strong current transmission ability, low energy loss.
- High hardness, good wear resistance, high coating quality, long service life.
- It can form a dense oxide film in the atmospheric environment and has strong corrosion resistance.
- It can prepare films with different optical properties and improve the performance of optical devices.
- Good plasticity, good cutting performance, easy to make a variety of shapes and sizes of the target.
Application
AlSi Sputtering Target is often used to uttering semiconductor chip packaging, optical component coating, solar cell back electrode, mechanical tool and mold coating, aerospace engine surface coating, glass coating and other fields to improve equipment performance. Test the role of mold and work efficiency.
Aluminum Silicon AlSi Round Target Specifications:
|
Material |
AlSi1,AlSi5,AlSi10 |
|
Purity |
99.999% |
|
Melting Point |
600-760 °C |
|
Thickness |
2-40mm |
|
Diameter |
≤300mm |
|
Density |
2.7g/cm3 |
|
Shape |
Discs |
|
Surface |
Polished, Alkali Cleaning, Grinding, |
|
Standard |
ASTM, AMS, GB |
|
Delivery Time |
15-20 days |
|
Certification |
ISO 9001 |
Aluminum Silicon AlSi Round Target Pictures
