Chromium Cr Metal Target
Chromium Cr Metal Target Description
As a transition metal, chromium has excellent hardness, high melting point and good corrosion resistance. Chromium Cr Metal Target is a type of sputtering source that forms various functional films on the substrate by sputtering under appropriate process conditions through magnetron sputtering, multi-arc ion plating or other types of coating processes. Chromium Cr Metal Target is often made using powder metallurgy and arc melting technology, which can produce high-quality, uniform films under vacuum conditions with specific properties such as radiation resistance, wear resistance, reflectivity, and ornamental value. According to different shapes, they can be divided into round targets, flat targets, stamping targets and spray targets. Chromium Cr Metal Target can be widely used in the semiconductor industry, integrated circuits, microelectronic devices, photovoltaic solar cell industry, automobile and construction industries and other fields.
Chromium Cr Metal Target Specifications:
|
Material |
Cr |
|
Purity |
99.95% |
|
Density |
8.9g/cm3 |
|
Processes |
Hot isostatic pressing,Sintering,Vacuum Melting,Forging,Machining |
|
Column |
Dia<650mm,Thickness >5mm |
|
Planar |
Length <1500mm,Width<300mm |
|
Rotory Target |
OD:20mm-160mm,Thickness:2-20mm |
|
Surface |
Polished |
|
Melting Point |
1857℃ |
|
Standard |
ASTM B550,ASTM B551,GB |
|
Deliver time |
About 20 days |
|
Certification |
ISO9001 |
Chromium Cr Metal Target Pictures
