High Purity 99.95% Zirconium Zr Sputtering Target For Thin Film Coating
High Purity Zirconium 99.95% Zr Sputtering Target For Thin Film Coating
It has a density of 6.49 g/cc, a melting point of 1,852°C, and a vapor pressure of 10-4 Torr at 1,987°C. It is silvery-white in appearance and its propensity for corrosion resistance makes it heavily used by the chemical industry. Zirconium can be found in surgical appliances, superconductive magnets, and the cladding of nuclear reactors. It is also utilized as an alloying agent for steel. Its compound, zirconia, is often a substitute for diamonds in jewelry. Zirconium, along with its alloys and compounds, is evaporated under vacuum for optical coatings, semiconductors, and data storage devices.
Zirconium sputtering target is used for thin film deposition, fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Zirconium sputtering target is available in various forms, purities, sizes, and prices. to bring you the highest quality products with the most affordable pricing.
Specification
|
Product name |
zirconium metal alloy sputtering target |
|
Material |
nickel zirconium metal alloy , Nb-Zr10 |
|
Grade |
R60702,R60703,R60704,R60705,R60706 |
|
Purity |
99.95% |
|
Specifications |
Dia.1.0mm–160mm ,client 's need |
|
Standard |
ASTM B550 |
|
Application |
sputtering, coating, plating |
Zirconium Zr Sputtering Target Picture:
