TiSi Titanium Silicon Sputtering Targets
TiSi Titanium Silicon Sputtering Targets Pictures:
Sputtering targets are important components for operating magnetron sputtering technology and can be divided into three types: metals, alloys and ceramics. The higher the purity of the material, the higher the quality of the sputtered coating and the better its wear resistance, and the longer the protection of the tool. TiSi Titanium Silicon Sputtering Targets can be divided into flat targets, arc targets, cylindrical targets and tubular targets. They are generally produced using advanced HIP technology and have high hardness, low wear, excellent thermal shock resistance and purity. High, fine and uniform grains, long service life, high oxidation resistance and high coating quality, etc. Titanium Silicon Sputtering Targets are very suitable for working in harsh environments and are often used in PVD or CVD coating systems. They are very suitable for applications in the decorative coating industry, semiconductor device coating, hardware tool coating, automotive glass coating, vacuum coating, Medical industry, LED and photovoltaic devices and other fields.
TiSi Titanium Silicon Sputtering Targets Specifications:
|
Material |
TiSi |
|
Technique |
Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining |
|
Purity |
95% |
|
Size |
Discs(Dia 300mm) Sheet(Length 600mm, Width 300mm) Tube (Diameter< 300mm) |
|
Thickness |
1mm-100mm |
|
Density |
4.46g/cm3 |
|
Surface |
Polished,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Disc,Plate,Rectangular,Square,Column Targets |
|
Standard |
ASTM B348,GB,AMS,DIS |
|
Certification |
ISO9001 |
TiSi Titanium Silicon Sputtering Targets Picture
