Titanium Sputtering
Titanium Ti Sputtering Targets
High-purity titanium is a key consumable in the magnetron sputtering process and an important functional thin film material in the field of electronic information. Titanium Sputtering can be divided into titanium targets for integrated circuits (99.999%) and titanium targets for flat panel displays (99.9%) according to the purity and application environment. Both of them have various excellent properties of titanium, such as extremely high hardness , outstanding corrosion resistance, high coating quality, high temperature resistance and durability. Our company can provide titanium metal targets of various purity and sizes, if necessary, please contact us by email.
Application of Titanium Sputtering:
1. Decorative coating industry: mainly on the surface coating of mobile phones, watches and hardware parts, etc., which not only has a beautifying effect, but also adds wear-resistant and corrosion-resistant functions.
2. Glass coating industry: sputtering multi-layer titanium films on glass to achieve energy saving, light control and decoration.
3. Integrated circuit chip manufacturing industry and information storage industry: Titanium film can reduce weight, diffuse heat, and increase service life
4. Other fields such as optical equipment, solar cells, medical equipment and aerospace components
Titanium Sputtering Specifications:
|
Grade |
TA1,TA2,TC4 |
|
Technique |
Sintering,Forging,Annealing,Rolling,Vacuum Melting,Machining |
|
Purity |
99.9%-99.995% |
|
Circular Diameter |
OD:50-300mm,ID:30-280mm |
|
Planar Size |
Length 1800mm,Width 400mm Thickness>1mm |
|
Tube Size |
OD:20mm-160mm,Thickness:2-20mm |
|
Density |
4.52g/cm3 |
|
Surface |
Polishing,Bright,Chemical Cleaning,Black Oxide,etc. |
|
Shape |
Disc,Plate,Rectangular,Square |
|
Standard |
ASTM B385,GB |
|
Certification |
ISO9001 |
Titanium Sputtering Picture:
