Zirconium Sputtering Target Highly Pure Best Price
Zirconium Sputtering Target Highly Pure Best Price
High Purity Metal Sputtering Targets
JINXING MATMETALS Is a professional manufacturer of metal materials, providing various specifications of tungsten, molybdenum, tantalum, niobium, titanium and other materials and deep processing products for different customers.
Specializing in the production of titanium plate/pipe/tube/foil/sputtering targets for 10 years, and has many years of production experience and production process for titanium plate/pipe/tube/foil/sputtering targets.
Zirconium sputtering target is used for thin film deposition, fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.JINXING MATMETALS is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Zirconium Sputtering Target Picture;
Featured targets
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,
2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target (80:20, 70:30,wt%),
5) Al/Cr alloy target (70:30,50:50at%)
6) Nb/Zr alloy target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material
